Lithography Stages

• The Nanorobotics XY-stages from Klocke Nanotechnik are small enough for an assembly onto every existing SEM/FIB sample stage
• They offer sub-Nanometer resolution in movement
• They offer sub-micron stitching accuracy
• Their hardware and software is fully compatible to the Nanoworkbench application packages from Klocke Nanotechnik
• The e-beam lithography application can be expanded later e.g. by a Nano-Probing,
  Nano-Cutting or Nano-Cleaning application package operating in the same control System.

• Stitching accuracy around 500 nm with 20, 30 or 40 mm range
• High vacuum feedthrough and cable set for SEM operation
• Network controller with Ethernet communication
• Power supply and sub-rack housing
• Universal lithography sample holder
• Typical sample size up to 30x 30 mm²
• Small dimensions to fit in every electron microscope
• High vacuum compatible

• 20 mm or 30 mm stroke versions for x- and y-axis available
• Compatible to RAITH lithography software
• Expandable by Nanorobotics Manipulators, e.g. for Nano-Probing, Nano-Cutting or Nano-Cleaning
• Live Image Positioning for sample stage and manipulators
• Move the tip by a simple mouse click in the Live Image Positioning Module

XY-positioning and stitching improvements for conventional SEM based
lithography solutions by piezoelectric sub-stage assembly
Raith GmbH
Download PDF